The Burton, Cabrera and Frank model for step flow is discussed in the case of evaporation, taking into account vacancy formation. In this framework, the criterion for nucleation of polyvacancies ("Lochkeime") on an evaporating vicinal surface with step-step separation l is found to be roughly κl > βγ, where γ is the step stiffness, 1/κ = √Dτv, D is the adatom diffusion constant, τv is the average residence time of adatoms on the surface before desorption and 1/β = kBT. Application to silicon is discussed.
|Original language||English (US)|
|Number of pages||22|
|Journal||Physica A: Statistical Mechanics and its Applications|
|State||Published - Mar 1 1994|
ASJC Scopus subject areas
- Statistics and Probability
- Condensed Matter Physics