TiO2 thin films formation on industrial glass through self-assembly processing

Dan Huang; Zhong Dang Xiao; Jian Hua Gu; Ning Ping Huang; Cuan Wei Yuan

doi:10.1016/S0040-6090(97)00202-2

TiO₂ thin films formation on industrial glass through self-assembly processing

Dan Huang, Zhong Dang Xiao, Jian Hua Gu, Ning Ping Huang, Cuan Wei Yuan

Houston Methodist

Research output: Contribution to journal › Article › peer-review

98 Scopus citations

Abstract

Silane coupling reagent ((CH₃O)₃Si(CH₂)₃SH) was self-assembled on the industrial glass substrates to form two-dimensional organic monolayer and the terminal -SH functional group was oxidized into -SO₃H groups in situ. By exploiting the chemisorption properties of the -SO₃H group, titanium dioxide (TiO₂) thin films were prepared by deposition in aqueous HCl solution of TiCl₄ at 80°C. X-ray photoelectron spectroscopy (XPS) analysis showed that TiO₂ thin films were successfully prepared, and atomic force microscopy (AFM) images confirmed that the films were consisted of packed TiO₂ crystallites over 100 nm in size. TiO₂ thin films were in excellent adherence. The synthesis of TiO₂ films has a prospect in industrial application.

Original language	English (US)
Pages (from-to)	110-115
Number of pages	6
Journal	Thin Solid Films
Volume	305
Issue number	1-2
DOIs	https://doi.org/10.1016/S0040-6090(97)00202-2
State	Published - Aug 1997

Keywords

Atomic force microscopy
X-ray photoelectron spectroscopy

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/S0040-6090(97)00202-2

Cite this

@article{e60e611aba1843d88a6c822966f8c431,

title = "TiO2 thin films formation on industrial glass through self-assembly processing",

abstract = "Silane coupling reagent ((CH3O)3Si(CH2)3SH) was self-assembled on the industrial glass substrates to form two-dimensional organic monolayer and the terminal -SH functional group was oxidized into -SO3H groups in situ. By exploiting the chemisorption properties of the -SO3H group, titanium dioxide (TiO2) thin films were prepared by deposition in aqueous HCl solution of TiCl4 at 80°C. X-ray photoelectron spectroscopy (XPS) analysis showed that TiO2 thin films were successfully prepared, and atomic force microscopy (AFM) images confirmed that the films were consisted of packed TiO2 crystallites over 100 nm in size. TiO2 thin films were in excellent adherence. The synthesis of TiO2 films has a prospect in industrial application.",

keywords = "Atomic force microscopy, X-ray photoelectron spectroscopy",

author = "Dan Huang and Xiao, {Zhong Dang} and Gu, {Jian Hua} and Huang, {Ning Ping} and Yuan, {Cuan Wei}",

note = "Funding Information: The financial support of the National Natural Science Foundation of China (No. 69371032) is gratefully acknowledged. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.",

year = "1997",

month = aug,

doi = "10.1016/S0040-6090(97)00202-2",

language = "English (US)",

volume = "305",

pages = "110--115",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "1-2",

}

TY - JOUR

T1 - TiO2 thin films formation on industrial glass through self-assembly processing

AU - Huang, Dan

AU - Xiao, Zhong Dang

AU - Gu, Jian Hua

AU - Huang, Ning Ping

AU - Yuan, Cuan Wei

N1 - Funding Information: The financial support of the National Natural Science Foundation of China (No. 69371032) is gratefully acknowledged. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.

PY - 1997/8

Y1 - 1997/8

N2 - Silane coupling reagent ((CH3O)3Si(CH2)3SH) was self-assembled on the industrial glass substrates to form two-dimensional organic monolayer and the terminal -SH functional group was oxidized into -SO3H groups in situ. By exploiting the chemisorption properties of the -SO3H group, titanium dioxide (TiO2) thin films were prepared by deposition in aqueous HCl solution of TiCl4 at 80°C. X-ray photoelectron spectroscopy (XPS) analysis showed that TiO2 thin films were successfully prepared, and atomic force microscopy (AFM) images confirmed that the films were consisted of packed TiO2 crystallites over 100 nm in size. TiO2 thin films were in excellent adherence. The synthesis of TiO2 films has a prospect in industrial application.

AB - Silane coupling reagent ((CH3O)3Si(CH2)3SH) was self-assembled on the industrial glass substrates to form two-dimensional organic monolayer and the terminal -SH functional group was oxidized into -SO3H groups in situ. By exploiting the chemisorption properties of the -SO3H group, titanium dioxide (TiO2) thin films were prepared by deposition in aqueous HCl solution of TiCl4 at 80°C. X-ray photoelectron spectroscopy (XPS) analysis showed that TiO2 thin films were successfully prepared, and atomic force microscopy (AFM) images confirmed that the films were consisted of packed TiO2 crystallites over 100 nm in size. TiO2 thin films were in excellent adherence. The synthesis of TiO2 films has a prospect in industrial application.

KW - Atomic force microscopy

KW - X-ray photoelectron spectroscopy

UR - http://www.scopus.com/inward/record.url?scp=0031211520&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031211520&partnerID=8YFLogxK

U2 - 10.1016/S0040-6090(97)00202-2

DO - 10.1016/S0040-6090(97)00202-2

M3 - Article

AN - SCOPUS:0031211520

SN - 0040-6090

VL - 305

SP - 110

EP - 115

JO - Thin Solid Films

JF - Thin Solid Films

IS - 1-2

ER -