Ti-based oxide thin films deposited from solution on self-assembly monolayer

Xiao Zhongdang; Xu Minhua; Gu Jianhua; Huang Dang; Lu Zuhong

doi:10.1016/S0254-0584(98)80020-5

Ti-based oxide thin films deposited from solution on self-assembly monolayer

Xiao Zhongdang, Xu Minhua, Gu Jianhua, Huang Dang, Lu Zuhong

Houston Methodist

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

Mercaptopropyltrimethoxysilane-bearing mercapto groups were used to form self-assembly monolayers (SAMs) on glass substrates. The terminal groups (-SH) of SAMs were oxidized into sulphonate groups (-SO₃H). The role of the sulphonate groups is to augment hydrolysis in the bulk solution by providing anionic reaction centers for oxide formation. The deposition of titanium oxide thin films in varied acidity of TiCl₄ solution has a different yield. Several titanium oxidation states exist in the deposited thin films.

Original language	English (US)
Pages (from-to)	170-174
Number of pages	5
Journal	Materials Chemistry and Physics
Volume	52
Issue number	2
DOIs	https://doi.org/10.1016/S0254-0584(98)80020-5
State	Published - Feb 1998

Keywords

Self-assembly monolayers
Titanium oxide thin films
X-ray photoelectron spectroscopy

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics

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10.1016/S0254-0584(98)80020-5

Cite this

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title = "Ti-based oxide thin films deposited from solution on self-assembly monolayer",

abstract = "Mercaptopropyltrimethoxysilane-bearing mercapto groups were used to form self-assembly monolayers (SAMs) on glass substrates. The terminal groups (-SH) of SAMs were oxidized into sulphonate groups (-SO3H). The role of the sulphonate groups is to augment hydrolysis in the bulk solution by providing anionic reaction centers for oxide formation. The deposition of titanium oxide thin films in varied acidity of TiCl4 solution has a different yield. Several titanium oxidation states exist in the deposited thin films.",

keywords = "Self-assembly monolayers, Titanium oxide thin films, X-ray photoelectron spectroscopy",

author = "Xiao Zhongdang and Xu Minhua and Gu Jianhua and Huang Dang and Lu Zuhong",

note = "Funding Information: This work was supported by the National Natural Science Foundation of China (No. 69371032). The discussions of Professor Yang Weiyi and Mr Chen Wenfeng are gratefully acknowledged. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.",

year = "1998",

month = feb,

doi = "10.1016/S0254-0584(98)80020-5",

language = "English (US)",

volume = "52",

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journal = "Materials Chemistry and Physics",

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TY - JOUR

T1 - Ti-based oxide thin films deposited from solution on self-assembly monolayer

AU - Zhongdang, Xiao

AU - Minhua, Xu

AU - Jianhua, Gu

AU - Dang, Huang

AU - Zuhong, Lu

N1 - Funding Information: This work was supported by the National Natural Science Foundation of China (No. 69371032). The discussions of Professor Yang Weiyi and Mr Chen Wenfeng are gratefully acknowledged. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.

PY - 1998/2

Y1 - 1998/2

N2 - Mercaptopropyltrimethoxysilane-bearing mercapto groups were used to form self-assembly monolayers (SAMs) on glass substrates. The terminal groups (-SH) of SAMs were oxidized into sulphonate groups (-SO3H). The role of the sulphonate groups is to augment hydrolysis in the bulk solution by providing anionic reaction centers for oxide formation. The deposition of titanium oxide thin films in varied acidity of TiCl4 solution has a different yield. Several titanium oxidation states exist in the deposited thin films.

AB - Mercaptopropyltrimethoxysilane-bearing mercapto groups were used to form self-assembly monolayers (SAMs) on glass substrates. The terminal groups (-SH) of SAMs were oxidized into sulphonate groups (-SO3H). The role of the sulphonate groups is to augment hydrolysis in the bulk solution by providing anionic reaction centers for oxide formation. The deposition of titanium oxide thin films in varied acidity of TiCl4 solution has a different yield. Several titanium oxidation states exist in the deposited thin films.

KW - Self-assembly monolayers

KW - Titanium oxide thin films

KW - X-ray photoelectron spectroscopy

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DO - 10.1016/S0254-0584(98)80020-5

M3 - Article

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EP - 174

JO - Materials Chemistry and Physics

JF - Materials Chemistry and Physics

IS - 2

ER -

Ti-based oxide thin films deposited from solution on self-assembly monolayer

Abstract

Keywords

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