The influence of substrate anisotropy on laser-focused atom deposition studied by two-dimensional Monte Carlo simulation

Florin Nita; Alberto Pimpinelli

doi:10.1063/1.1913795

The influence of substrate anisotropy on laser-focused atom deposition studied by two-dimensional Monte Carlo simulation

Florin Nita, Alberto Pimpinelli

Research output: Contribution to journal › Article

3 Scopus citations

Abstract

We study the role of the surface diffusion anisotropy in the fabrication of nanostructures by laser-focused ("cold") atom lithography, and on the stability of nanostructures using two-dimensional kinetic Monte Carlo simulations. The simulations were performed using one- and two-directional standing-wave fields (using two different wave profiles) and two different diffusion models (limited and total diffusion model) on anisotropic surfaces, such as (110) surfaces of face-centered-cubic crystals, or reconstructed surfaces such as Si(100). The simulations were made with and without Schwoebel barriers. Our diffusion-deposition models reproduce qualitatively experimental results.

Original language	English (US)
Article number	113529
Journal	Journal of Applied Physics
Volume	97
Issue number	11
DOIs	https://doi.org/10.1063/1.1913795
State	Published - 2005

ASJC Scopus subject areas

Physics and Astronomy(all)

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10.1063/1.1913795

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AB - We study the role of the surface diffusion anisotropy in the fabrication of nanostructures by laser-focused ("cold") atom lithography, and on the stability of nanostructures using two-dimensional kinetic Monte Carlo simulations. The simulations were performed using one- and two-directional standing-wave fields (using two different wave profiles) and two different diffusion models (limited and total diffusion model) on anisotropic surfaces, such as (110) surfaces of face-centered-cubic crystals, or reconstructed surfaces such as Si(100). The simulations were made with and without Schwoebel barriers. Our diffusion-deposition models reproduce qualitatively experimental results.

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