The influence of substrate anisotropy on laser-focused atom deposition studied by two-dimensional Monte Carlo simulation

Florin Nita, Alberto Pimpinelli

Research output: Contribution to journalArticle

3 Scopus citations

Abstract

We study the role of the surface diffusion anisotropy in the fabrication of nanostructures by laser-focused ("cold") atom lithography, and on the stability of nanostructures using two-dimensional kinetic Monte Carlo simulations. The simulations were performed using one- and two-directional standing-wave fields (using two different wave profiles) and two different diffusion models (limited and total diffusion model) on anisotropic surfaces, such as (110) surfaces of face-centered-cubic crystals, or reconstructed surfaces such as Si(100). The simulations were made with and without Schwoebel barriers. Our diffusion-deposition models reproduce qualitatively experimental results.

Original languageEnglish (US)
Article number113529
JournalJournal of Applied Physics
Volume97
Issue number11
DOIs
StatePublished - 2005

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'The influence of substrate anisotropy on laser-focused atom deposition studied by two-dimensional Monte Carlo simulation'. Together they form a unique fingerprint.

Cite this