The deposition of TiO 2 thin films on self-assembly monolayers studied by X-ray photoelectron spectroscopy

Zhongdang Xiao, Jianhua Gu, Dan Huang, Zuhong Lu, Yu Wei

Research output: Contribution to journalArticle

34 Scopus citations

Abstract

The deposition of TiO 2 films on silanized industrial glass surfaces was investigated by XPS. The results show that mercaptopropyltrimethoxysilane was self-assembled on the industrial glass surface and the terminal groups (-SH) were nearer to the air/silane interface than the silicon atoms. Longer treatment of SAMs with hydrogen peroxide in acetic acid can make the conversion of the terminal groups in the top-most layer into desirable sulfonate groups complete. TiO 2 thin films are successfully absorbed on self-assembly monolayers and titanium oxide with different oxidation states may exist in the thin films as-deposited on the surface of the self-assembly monolayers.

Original languageEnglish (US)
Pages (from-to)85-92
Number of pages8
JournalApplied Surface Science
Volume125
Issue number1
DOIs
StatePublished - Jan 1998

Keywords

  • Self-assembly monolayers
  • Thin films
  • TiO
  • XPS

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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