Abstract
The deposition of TiO 2 films on silanized industrial glass surfaces was investigated by XPS. The results show that mercaptopropyltrimethoxysilane was self-assembled on the industrial glass surface and the terminal groups (-SH) were nearer to the air/silane interface than the silicon atoms. Longer treatment of SAMs with hydrogen peroxide in acetic acid can make the conversion of the terminal groups in the top-most layer into desirable sulfonate groups complete. TiO 2 thin films are successfully absorbed on self-assembly monolayers and titanium oxide with different oxidation states may exist in the thin films as-deposited on the surface of the self-assembly monolayers.
Original language | English (US) |
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Pages (from-to) | 85-92 |
Number of pages | 8 |
Journal | Applied Surface Science |
Volume | 125 |
Issue number | 1 |
DOIs | |
State | Published - Jan 1998 |
Keywords
- Self-assembly monolayers
- Thin films
- TiO
- XPS
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films