Textured thin-film Si solar selective absorbers using reactive ion etching

Harold G. Craighead, R. E. Howard, D. M. Tennant

Research output: Contribution to journalArticle

48 Scopus citations

Abstract

Solar selective surface photothermal absorbers consisting of thin-film Si with a submicron surface texture have been produced by reactive ion etching an evaporated Si film on a Mo layer. Such surfaces formed on 316 stainless steel and other substrates have solar absorptivities of 0.9 and calculated thermal emissivities of ∼0.2 at 200°C. These selective surfaces are stable in air to 500°C.

Original languageEnglish (US)
Pages (from-to)653-655
Number of pages3
JournalApplied Physics Letters
Volume37
Issue number7
DOIs
StatePublished - Dec 1 1980

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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