Submicron, vacuum ultraviolet contact lithography with an F2 excimer laser

J. C. White; H. G. Craighead; R. E. Howard; L. D. Jackel; R. E. Behringer; R. W. Epworth; D. Henderson; J. E. Sweeney

doi:10.1063/1.94589

Submicron, vacuum ultraviolet contact lithography with an F₂ excimer laser

J. C. White, H. G. Craighead, R. E. Howard, L. D. Jackel, R. E. Behringer, R. W. Epworth, D. Henderson, J. E. Sweeney

Houston Methodist

Research output: Contribution to journal › Article › peer-review

37 Scopus citations

Abstract

An F//2 excimer laser at 157 nm has been used for the first time as an exposure source for high resolution photolithography. At this short wavelength, conventional glass and quartz mask substrates are opaque, and therefore alkaline-earth halides and sapphire were used as mask substrates. The masks were patterned by electron beam lithography, and mask features as narrow as 150 nm have been replicated and represent the smallest features yet produced by contact photolithography.

Original language	English (US)
Pages (from-to)	22-24
Number of pages	3
Journal	Applied Physics Letters
Volume	44
Issue number	1
DOIs	https://doi.org/10.1063/1.94589
State	Published - 1984

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.94589

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abstract = "An F//2 excimer laser at 157 nm has been used for the first time as an exposure source for high resolution photolithography. At this short wavelength, conventional glass and quartz mask substrates are opaque, and therefore alkaline-earth halides and sapphire were used as mask substrates. The masks were patterned by electron beam lithography, and mask features as narrow as 150 nm have been replicated and represent the smallest features yet produced by contact photolithography.",

author = "White, {J. C.} and Craighead, {H. G.} and Howard, {R. E.} and Jackel, {L. D.} and Behringer, {R. E.} and Epworth, {R. W.} and D. Henderson and Sweeney, {J. E.}",

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AU - White, J. C.

AU - Craighead, H. G.

AU - Howard, R. E.

AU - Jackel, L. D.

AU - Behringer, R. E.

AU - Epworth, R. W.

AU - Henderson, D.

AU - Sweeney, J. E.

PY - 1984

Y1 - 1984

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Submicron, vacuum ultraviolet contact lithography with an F₂ excimer laser

Abstract

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