Submicron, vacuum ultraviolet contact lithography with an F2 excimer laser

J. C. White; H. G. Craighead; R. E. Howard; L. D. Jackel; R. E. Behringer; R. W. Epworth; D. Henderson; J. E. Sweeney

doi:10.1063/1.94589

Submicron, vacuum ultraviolet contact lithography with an F₂ excimer laser

J. C. White, H. G. Craighead, R. E. Howard, L. D. Jackel, R. E. Behringer, R. W. Epworth, D. Henderson, J. E. Sweeney

Research output: Contribution to journal › Article › peer-review

34 Scopus citations

Abstract

An F//2 excimer laser at 157 nm has been used for the first time as an exposure source for high resolution photolithography. At this short wavelength, conventional glass and quartz mask substrates are opaque, and therefore alkaline-earth halides and sapphire were used as mask substrates. The masks were patterned by electron beam lithography, and mask features as narrow as 150 nm have been replicated and represent the smallest features yet produced by contact photolithography.

Original language	English (US)
Pages (from-to)	22-24
Number of pages	3
Journal	Applied Physics Letters
Volume	44
Issue number	1
DOIs	https://doi.org/10.1063/1.94589
State	Published - 1984

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.94589

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@article{ee00f0b4452d4de3b6166e70e182fb7c,

title = "Submicron, vacuum ultraviolet contact lithography with an F2 excimer laser",

abstract = "An F//2 excimer laser at 157 nm has been used for the first time as an exposure source for high resolution photolithography. At this short wavelength, conventional glass and quartz mask substrates are opaque, and therefore alkaline-earth halides and sapphire were used as mask substrates. The masks were patterned by electron beam lithography, and mask features as narrow as 150 nm have been replicated and represent the smallest features yet produced by contact photolithography.",

author = "White, {J. C.} and Craighead, {H. G.} and Howard, {R. E.} and Jackel, {L. D.} and Behringer, {R. E.} and Epworth, {R. W.} and D. Henderson and Sweeney, {J. E.}",

year = "1984",

doi = "10.1063/1.94589",

language = "English (US)",

volume = "44",

pages = "22--24",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "1",

}

TY - JOUR

T1 - Submicron, vacuum ultraviolet contact lithography with an F2 excimer laser

AU - White, J. C.

AU - Craighead, H. G.

AU - Howard, R. E.

AU - Jackel, L. D.

AU - Behringer, R. E.

AU - Epworth, R. W.

AU - Henderson, D.

AU - Sweeney, J. E.

PY - 1984

Y1 - 1984

N2 - An F//2 excimer laser at 157 nm has been used for the first time as an exposure source for high resolution photolithography. At this short wavelength, conventional glass and quartz mask substrates are opaque, and therefore alkaline-earth halides and sapphire were used as mask substrates. The masks were patterned by electron beam lithography, and mask features as narrow as 150 nm have been replicated and represent the smallest features yet produced by contact photolithography.

AB - An F//2 excimer laser at 157 nm has been used for the first time as an exposure source for high resolution photolithography. At this short wavelength, conventional glass and quartz mask substrates are opaque, and therefore alkaline-earth halides and sapphire were used as mask substrates. The masks were patterned by electron beam lithography, and mask features as narrow as 150 nm have been replicated and represent the smallest features yet produced by contact photolithography.

UR - http://www.scopus.com/inward/record.url?scp=0021169033&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0021169033&partnerID=8YFLogxK

U2 - 10.1063/1.94589

DO - 10.1063/1.94589

M3 - Article

AN - SCOPUS:0021169033

VL - 44

SP - 22

EP - 24

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 1

ER -

Submicron, vacuum ultraviolet contact lithography with an F₂ excimer laser

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