Self-assembled monolayers as high-resolution etch masks and templates for organic molecular assembly

C. K. Harnett, A. G. Lopez, K. M. Satyalakshmi, Y. F. Chen, H. G. Craighead

Research output: Contribution to journalConference article

2 Scopus citations

Abstract

We have used a variety of self-assembled monolayers as resists for low energy electron beam patterning. These compounds can be used as high-resolution patternable linker molecules for selected area binding of proteins and other organic compounds, as well as nanoparticles with organic chemical coatings. Because these systems can be aligned in registry to existing patterns, the organic systems may be positioned with the accuracy of electron-beam lithography. We have also explored the use of self-assembled monolayers for the creation of sub-wavelength artificial dielectric systems. The ultra-thin patterned monolayer is combined with a contrast-enhancing etch process to create high aspect ratio structures. This technique can be used to fabricate diffractive optical devices in a single-step process.

Original languageEnglish (US)
Pages (from-to)D661-D666
JournalMaterials Research Society Symposium - Proceedings
Volume636
StatePublished - 2001
EventNonlithigraphic and Lithographic Methods of Nanofabrication -From Ultralarge-Scale Integration to Photonics to Molecular Electronics - Boston, MA, United States
Duration: Nov 26 2000Dec 1 2000

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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