Abstract
In this letter is decribed a spectrally selective tungsten light-emitting surface, employing submicron surface texturing produced by reactive ion etching. The average emissivity of this surface throughout the visible wavelength range of 0.3-0.7 μm is greater than 0.9 compared to ∼0.4 for ordinary tungsten. At longer infrared wavelengths, however, the emissivity of the etched surface approaches that of a smooth tungsten surface. This results in enhanced efficiency in the production of visible light.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 74-76 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 38 |
| Issue number | 2 |
| DOIs | |
| State | Published - 1981 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)