Abstract
In this letter is decribed a spectrally selective tungsten light-emitting surface, employing submicron surface texturing produced by reactive ion etching. The average emissivity of this surface throughout the visible wavelength range of 0.3-0.7 μm is greater than 0.9 compared to ∼0.4 for ordinary tungsten. At longer infrared wavelengths, however, the emissivity of the etched surface approaches that of a smooth tungsten surface. This results in enhanced efficiency in the production of visible light.
Original language | English (US) |
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Pages (from-to) | 74-76 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 38 |
Issue number | 2 |
DOIs | |
State | Published - 1981 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)