Selective solar absorption of chemically etched aluminum-silicon films

G. A. Niklasson; H. G. Craighead

doi:10.1063/1.332698

Selective solar absorption of chemically etched aluminum-silicon films

G. A. Niklasson, H. G. Craighead

Houston Methodist

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Electron-beam evaporated aluminum-silicon composites were chemically etched in a NaOH solution. This treatment produced a textured surface with high solar absorptance and low thermal emittance. The optical properties were qualitatively described by a graded refractive index model.

Original language	English (US)
Pages (from-to)	5488-5490
Number of pages	3
Journal	Journal of Applied Physics
Volume	54
Issue number	9
DOIs	https://doi.org/10.1063/1.332698
State	Published - 1983

ASJC Scopus subject areas

General Physics and Astronomy

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title = "Selective solar absorption of chemically etched aluminum-silicon films",

abstract = "Electron-beam evaporated aluminum-silicon composites were chemically etched in a NaOH solution. This treatment produced a textured surface with high solar absorptance and low thermal emittance. The optical properties were qualitatively described by a graded refractive index model.",

author = "Niklasson, {G. A.} and Craighead, {H. G.}",

year = "1983",

doi = "10.1063/1.332698",

language = "English (US)",

volume = "54",

pages = "5488--5490",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "9",

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T1 - Selective solar absorption of chemically etched aluminum-silicon films

AU - Niklasson, G. A.

AU - Craighead, H. G.

PY - 1983

Y1 - 1983

N2 - Electron-beam evaporated aluminum-silicon composites were chemically etched in a NaOH solution. This treatment produced a textured surface with high solar absorptance and low thermal emittance. The optical properties were qualitatively described by a graded refractive index model.

AB - Electron-beam evaporated aluminum-silicon composites were chemically etched in a NaOH solution. This treatment produced a textured surface with high solar absorptance and low thermal emittance. The optical properties were qualitatively described by a graded refractive index model.

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U2 - 10.1063/1.332698

DO - 10.1063/1.332698

M3 - Article

AN - SCOPUS:0020824179

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SP - 5488

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JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 9

ER -

Selective solar absorption of chemically etched aluminum-silicon films

Abstract

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