Abstract
We present the scanning tunneling microscope-induced luminescence (STL) imaging of defects in optoelectronic materials. Resolution is first discussed using cross-sectional images of InGaAs/GaAs quantum dots. Proof of concept is then provided through the nanometer-scale imaging of GaN layers and quantum wells. The expected λ=356±25 nm range dominates the low temperature STL of GaN. Mapping of luminescence shows circular non-emitting areas around threading dislocations. Extent of dark areas suggests a hole diffusion length of L d=30-55 nm, in agreement with reported values. The expected λ=450±35 nm range dominates the STL from a buried InGaN/GaN multiple quantum well. Imaging reveals 30-100 nm wide smooth fluctuations of luminescence.
Original language | English (US) |
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Title of host publication | Materials Research Society Symposium - Proceedings |
Publisher | Materials Research Society |
Pages | 19-24 |
Number of pages | 6 |
Volume | 588 |
State | Published - 2000 |
Event | The 1999 MRS Fall Meeting - Symposium P 'Optical Microstructural Characterization of Semiconductors' - Boston, MA, USA Duration: Nov 29 1999 → Nov 30 1999 |
Other
Other | The 1999 MRS Fall Meeting - Symposium P 'Optical Microstructural Characterization of Semiconductors' |
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City | Boston, MA, USA |
Period | 11/29/99 → 11/30/99 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials