Abstract
We present a model for thin film growth by particle deposition that takes into account the possible evaporation of the particles deposited on the surface as well as the effect of point defects. Our focus is on the early formation kinetics of two-dimensional islands on the surface, in particular in the scaling properties of the maximum number of islands formed on the surface. Most of our results are obtained through the analysis of rate equations describing the system. They are supported by simple scaling arguments and are confirmed by extensive computer simulations. We find significant differences with previous studies of this system which arise from different physical hypotheses concerning the mechanisms of island growth in the presence of evaporation.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 253-258 |
| Number of pages | 6 |
| Journal | Materials Research Society Symposium - Proceedings |
| Volume | 440 |
| State | Published - 1997 |
| Event | Proceedings of the 1996 MRS Fall Symposium - Boston, MA, USA Duration: Dec 2 1996 → Dec 5 1996 |
ASJC Scopus subject areas
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering