Pulsed vacuum and etching systems: Theoretical design considerations for a pulsed vacuum system and its application to XeF2 etching of Si

Arash Kheyraddini Mousavi, Khawar Abbas, Mirza Mohammad Mahbube Elahi, Edidson Lima, Stephen Moya, Joseph Daniel Butner, Denise Piñon, Adeeko Benga, Behnam Kheyraddini Mousavi, Zayd Chad Leseman

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