Proton implantation intermixing of GaAs/AlGaAs quantum wells

Gregory F. Redinbo, Harold G. Craighead, J. Minghuang Hong

Research output: Contribution to journalArticle

26 Scopus citations

Abstract

We have investigated proton implantation enhanced intermixing of GaAs/AlGaAs quantum wells for H+ doses ranging from 5×10 13 to 1×1016 ions/cm2. Implantation of 20 keV H+ followed by a high temperature rapid thermal anneal leads to enhanced diffusion of Al into the GaAs quantum well. Shifts of electron-heavy hole recombination energies due to compositional changes were observed using room temperature cathodoluminescence. Diffusion lengths of longer than 2 nm were calculated from energy shifts in a 5 nm well and were found to vary with both implanted dose and anneal time, as expected if the enhanced interdiffusion is caused by implantation introduced defects.

Original languageEnglish (US)
Pages (from-to)3099-3102
Number of pages4
JournalJournal of Applied Physics
Volume74
Issue number5
DOIs
StatePublished - Dec 1 1993

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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