Positive and negative "resistless" lithography of GaAs by electron beam exposure and thermal Cl2 etching

E. M. Clausen, J. P. Harbison, C. C. Chang, P. S.D. Lin, H. G. Craighead, L. T. Florez

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

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Physics & Astronomy