We have used deposited polymer nanofibers as templates for the formation of functional nanomechanical devices, interfaced to lithographically defined surface microstructures. The deposition of oriented poly(methyl methacrylate) nanofibers, combined with contact photolithography, created silicon nitride nanomechanical oscillators with dimensions on the order of 100 nm. We used contact photolithography to define the support structures for the oscillators. The moving beams were defined in the device layer by using the deposited fiber as a mask for reactive ion etching using a CF4 plasma chemistry, followed by removal of a sacrificial underlying layer. After releasing the devices, the frequencies of the modes of oscillation of the beams were determined by laser interference techniques. The devices would self-oscillate due to the interferometric effects of the continuous wave (CW) detection laser. The oriented polymeric nanofiber deposition method, used in this experiment, offers an approach for the rapid formation of arrays of nanomechanical devices, connected to micromechanical structures, that would be difficult to form using a completely self-assembled or completely lithographic approach. This direction may provide a useful method for realizing nanoscale device architectures in a variety of active materials.
|Original language||English (US)|
|Number of pages||3|
|State||Published - Mar 1 2004|
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanical Engineering