TY - JOUR
T1 - Nanoelectromechanical systems
AU - Craighead, H. G.
PY - 2000/11/24
Y1 - 2000/11/24
N2 - Nanoelectromechanical systems are evolving, with new scientific studies and technical applications emerging. Mechanical devices are shrinking in thickness and width to reduce mass, increase resonant frequency, and lower the force constants of these systems. Advances in the field include improvements in fabrication processes and new methods for actuating and detecting motion at the nanoscale. Lithographic approaches are capable of creating freestanding objects in silicon and other materials, with thickness and lateral dimensions down to about 20 nanometers. Similar processes can make channels or pores of comparable dimensions, approaching the molecular scale. This allows access to a new experimental regime and suggests new applications in sensing and molecular interactions.
AB - Nanoelectromechanical systems are evolving, with new scientific studies and technical applications emerging. Mechanical devices are shrinking in thickness and width to reduce mass, increase resonant frequency, and lower the force constants of these systems. Advances in the field include improvements in fabrication processes and new methods for actuating and detecting motion at the nanoscale. Lithographic approaches are capable of creating freestanding objects in silicon and other materials, with thickness and lateral dimensions down to about 20 nanometers. Similar processes can make channels or pores of comparable dimensions, approaching the molecular scale. This allows access to a new experimental regime and suggests new applications in sensing and molecular interactions.
UR - http://www.scopus.com/inward/record.url?scp=0034711368&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0034711368&partnerID=8YFLogxK
U2 - 10.1126/science.290.5496.1532
DO - 10.1126/science.290.5496.1532
M3 - Review article
C2 - 11090343
AN - SCOPUS:0034711368
VL - 290
SP - 1532
EP - 1535
JO - Science (New York, N.Y.)
JF - Science (New York, N.Y.)
SN - 0036-8075
IS - 5496
ER -