Modifying hydrogen-bonded structures by physical vapor deposition: 4-methyl-3-heptanol

Chemistry

• Physical Vapour Deposition 100%
• Liquid 41%
• Dielectric Relaxation 31%
• Liquid Film 31%
• Dielectric Property 25%
• Dielectric Relaxation Time 20%
• Supercooling 17%
• Dielectric Loss 14%
• Supramolecular Structure 13%
• Dipole Moment 11%
• Dielectric Material 11%
• Drop 11%
• Glass Transition Temperature 10%
• Annealing 10%
• Glass 8%
• Behavior as Electrode 6%
• Time 4%
• Molecule 4%

Physics & Astronomy

• vapor deposition 59%
• hydrogen 47%
• liquids 40%
• vapors 29%
• dielectric properties 21%
• rings 17%
• supercooling 14%
• dielectric loss 12%
• glass transition temperature 12%
• dipole moments 11%
• relaxation time 10%
• heating 8%
• electrodes 7%
• annealing 7%
• temperature 7%
• glass 7%
• cells 6%
• molecules 6%