Metal deposition by electron beam exposure of an organometallic film

H. G. Craighead, L. M. Schiavone

Research output: Contribution to journalArticle

36 Scopus citations

Abstract

We describe a method of metal deposition by electron beam exposure and pyrolysis of a gold containing organometallic polymer. Commercial gold containing solutions were used as negative electron beam resists with line dose sensitivities of about 0.2 μC/cm as developed in methylene chloride. We have demonstrated the formation of metal patterns on Si, GaAs, and polyimide with linewidths as small as 0.25 μm.

Original languageEnglish (US)
Pages (from-to)1748-1750
Number of pages3
JournalApplied Physics Letters
Volume48
Issue number25
DOIs
StatePublished - 1986

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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