Abstract
Experiments were performed on Si-doped (n-type) α-GaN films grown in sapphire by molecular beam epitaxy (MBE). Doping concentrations in the range of n = 1018 to 1019 cm-3 were used. Scanning electron microscope-induced cathodoluminescence (SEM-CL) reveals submicrometer features and evidence of small quantities of cubic crystallites in some samples. Preliminary spectroscopic analysis involving band-pass filter suggest near band-edge emission, as well as emission covering the visible range.
Original language | English |
---|---|
Title of host publication | Conference on Lasers and Electro-Optics Europe - Technical Digest |
Editors | Anon |
Place of Publication | Piscataway, NJ, United States |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
State | Published - Jan 1 1998 |
Event | Proceedings of the 1998 Conference on Lasers and Electro-Optics, CLEO - San Francisco, CA, USA Duration: May 3 1998 → May 8 1998 |
Other
Other | Proceedings of the 1998 Conference on Lasers and Electro-Optics, CLEO |
---|---|
City | San Francisco, CA, USA |
Period | 5/3/98 → 5/8/98 |
ASJC Scopus subject areas
- Control and Systems Engineering
- Electrical and Electronic Engineering