Abstract
The optical properties of MgF2 films prepared by evaporation and ion-assisted deposition have been determined from transmittance and near-normal incidence reflectance measurements and also from electronenergy loss spectroscopy (EELS). The results show that oxygen-ion assistance leads to higher extinction coefficientsfor wavelengths <180 nm. Transmission electron microscopy studies show that the crystal grain size of MgF2 films is not strongly affected by oxygen or argon-ion bombardment. The presence of MgO in the films is inferred from RBS measurements and proposed to be the major factor influencing VUV losses. EELS is also demonstrated to be a valuable technique for determination of optical properties from the near-infrared to x-ray regions of the spectrum.
Original language | English (US) |
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Pages (from-to) | 1235-1239 |
Number of pages | 5 |
Journal | Applied Optics |
Volume | 26 |
Issue number | 7 |
DOIs | |
State | Published - Apr 1987 |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Engineering (miscellaneous)
- Electrical and Electronic Engineering