High-selectivity pattern transfer processes for self-assembled monolayer electron beam resists

Engineering & Materials Science

• Self assembled monolayers 100%
• Electron beams 75%
• Masks 60%
• Silicon 50%
• Electroless plating 43%
• Oxides 41%
• Ions 29%
• Electron cyclotron resonance 28%
• Nickel plating 23%
• Silicon oxides 23%
• Polysilicon 18%
• Crystalline materials 16%
• Nickel 14%
• Substrates 11%

Physics & Astronomy

• selectivity 60%
• electron beams 45%
• masks 43%
• silicon 34%
• plating 28%
• oxides 23%
• nickel 20%
• electroless deposition 18%
• electron cyclotron resonance 14%
• silicon oxides 13%
• ions 11%

Chemistry

• Electron Beam 69%
• Self Assembled Monolayer 62%
• Oxide 34%
• Electron Cyclotron Resonance 33%
• Silicon Oxide 26%
• Polycrystalline Solid 19%
• Ion 16%
• Modification 11%