Heat-depolymerizable polycarbonates as electron beam patternable sacrificial layers for nanofluidics

C. K. Harnett; G. W. Coates; H. G. Craighead

doi:10.1116/1.1409383

Heat-depolymerizable polycarbonates as electron beam patternable sacrificial layers for nanofluidics

C. K. Harnett, G. W. Coates, H. G. Craighead

Research output: Contribution to journal › Article

79 Scopus citations

Abstract

Fluidic structures were fabricated by exposing a heat-depolymerizable polycarbonate directly with an electron beam and using it as a sacrificial layer. Structures were capped by sputtered oxide deposited below 250°C. A substrate with silicon nitride membranes was developed to provide a very smooth surface for processing the 140 nm HDP layer, and to allow venting and fluid ports to be opened under the fluidic structures near the end of the process. Tubes and two-dimensional column structures were fabricated by baking the temporary HDP support out from under the column layer.

Original language	English (US)
Pages (from-to)	2842-2845
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	19
Issue number	6
DOIs	https://doi.org/10.1116/1.1409383
State	Published - Nov 2001

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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abstract = "Fluidic structures were fabricated by exposing a heat-depolymerizable polycarbonate directly with an electron beam and using it as a sacrificial layer. Structures were capped by sputtered oxide deposited below 250°C. A substrate with silicon nitride membranes was developed to provide a very smooth surface for processing the 140 nm HDP layer, and to allow venting and fluid ports to be opened under the fluidic structures near the end of the process. Tubes and two-dimensional column structures were fabricated by baking the temporary HDP support out from under the column layer.",

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