FABRICATION OF APPROX. 10 nm STRUCTURES BY ELECTRON BEAM LITHOGRAPHY.

Harold G. Craighead

FABRICATION OF APPROX. 10 nm STRUCTURES BY ELECTRON BEAM LITHOGRAPHY.

Harold G. Craighead

Houston Methodist

Research output: Contribution to journal › Conference article › peer-review

Abstract

With careful process control and a finely focused electron beam it is possible to lithographically produce structures with dimensions on the order of tens of nanometers. We have used a high resolution scanning electron microscope to perform experiments on the lithographic process and to fabricate ultrasmall structures for physics measurements. This paper presents a review of techniques and fabricated structure along with a discussion of electron scattering and materials consideration that limit the lithographic resolution.

Original language	English (US)
Pages (from-to)	353-354
Number of pages	2
Journal	American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Volume	26
Issue number	2
State	Published - Sep 1 1985

ASJC Scopus subject areas

Polymers and Plastics

Cite this

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title = "FABRICATION OF APPROX. 10 nm STRUCTURES BY ELECTRON BEAM LITHOGRAPHY.",

abstract = "With careful process control and a finely focused electron beam it is possible to lithographically produce structures with dimensions on the order of tens of nanometers. We have used a high resolution scanning electron microscope to perform experiments on the lithographic process and to fabricate ultrasmall structures for physics measurements. This paper presents a review of techniques and fabricated structure along with a discussion of electron scattering and materials consideration that limit the lithographic resolution.",

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year = "1985",

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T1 - FABRICATION OF APPROX. 10 nm STRUCTURES BY ELECTRON BEAM LITHOGRAPHY.

AU - Craighead, Harold G.

PY - 1985/9/1

Y1 - 1985/9/1

N2 - With careful process control and a finely focused electron beam it is possible to lithographically produce structures with dimensions on the order of tens of nanometers. We have used a high resolution scanning electron microscope to perform experiments on the lithographic process and to fabricate ultrasmall structures for physics measurements. This paper presents a review of techniques and fabricated structure along with a discussion of electron scattering and materials consideration that limit the lithographic resolution.

AB - With careful process control and a finely focused electron beam it is possible to lithographically produce structures with dimensions on the order of tens of nanometers. We have used a high resolution scanning electron microscope to perform experiments on the lithographic process and to fabricate ultrasmall structures for physics measurements. This paper presents a review of techniques and fabricated structure along with a discussion of electron scattering and materials consideration that limit the lithographic resolution.

UR - https://www.scopus.com/pages/publications/0022122489

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M3 - Conference article

AN - SCOPUS:0022122489

SN - 0032-3934

VL - 26

SP - 353

EP - 354

JO - American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

JF - American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

IS - 2

ER -

FABRICATION OF APPROX. 10 nm STRUCTURES BY ELECTRON BEAM LITHOGRAPHY.

Abstract

ASJC Scopus subject areas

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