TY - JOUR
T1 - FABRICATION OF APPROX. 10 nm STRUCTURES BY ELECTRON BEAM LITHOGRAPHY.
AU - Craighead, Harold G.
PY - 1985/9/1
Y1 - 1985/9/1
N2 - With careful process control and a finely focused electron beam it is possible to lithographically produce structures with dimensions on the order of tens of nanometers. We have used a high resolution scanning electron microscope to perform experiments on the lithographic process and to fabricate ultrasmall structures for physics measurements. This paper presents a review of techniques and fabricated structure along with a discussion of electron scattering and materials consideration that limit the lithographic resolution.
AB - With careful process control and a finely focused electron beam it is possible to lithographically produce structures with dimensions on the order of tens of nanometers. We have used a high resolution scanning electron microscope to perform experiments on the lithographic process and to fabricate ultrasmall structures for physics measurements. This paper presents a review of techniques and fabricated structure along with a discussion of electron scattering and materials consideration that limit the lithographic resolution.
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M3 - Conference article
AN - SCOPUS:0022122489
SN - 0032-3934
VL - 26
SP - 353
EP - 354
JO - American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
JF - American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
IS - 2
ER -