FABRICATION OF APPROX. 10 nm STRUCTURES BY ELECTRON BEAM LITHOGRAPHY.

Research output: Contribution to journalConference articlepeer-review

Abstract

With careful process control and a finely focused electron beam it is possible to lithographically produce structures with dimensions on the order of tens of nanometers. We have used a high resolution scanning electron microscope to perform experiments on the lithographic process and to fabricate ultrasmall structures for physics measurements. This paper presents a review of techniques and fabricated structure along with a discussion of electron scattering and materials consideration that limit the lithographic resolution.

Original languageEnglish (US)
Pages (from-to)353-354
Number of pages2
JournalAmerican Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Volume26
Issue number2
StatePublished - Sep 1 1985

ASJC Scopus subject areas

  • Polymers and Plastics

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