Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes

M. J. Lercel; G. F. Redinbo; M. Rooks; R. C. Tiberio; H. G. Craighead; C. W. Sheen; D. L. Allara

doi:10.1016/0167-9317(94)00052-V

Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes

M. J. Lercel, G. F. Redinbo, M. Rooks, R. C. Tiberio, H. G. Craighead, C. W. Sheen, D. L. Allara

Research output: Contribution to journal › Article › peer-review

28 Scopus citations

Abstract

Self-assembled monolayers have been demonstrated to perform as high-resolution electron beam resists with minimum resolutions of <20nm for 50keV electron beams and <15nm for 10eV electrons from a scanning tunneling microscope. The resulting patterns have been transferred into many substrates by both wet and dry etching.

Original language	English (US)
Pages (from-to)	43-46
Number of pages	4
Journal	Microelectronic Engineering
Volume	27
Issue number	1-4
DOIs	https://doi.org/10.1016/0167-9317(94)00052-V
State	Published - Feb 1995

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/0167-9317(94)00052-V

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title = "Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes",

abstract = "Self-assembled monolayers have been demonstrated to perform as high-resolution electron beam resists with minimum resolutions of <20nm for 50keV electron beams and <15nm for 10eV electrons from a scanning tunneling microscope. The resulting patterns have been transferred into many substrates by both wet and dry etching.",

author = "Lercel, {M. J.} and Redinbo, {G. F.} and M. Rooks and Tiberio, {R. C.} and Craighead, {H. G.} and Sheen, {C. W.} and Allara, {D. L.}",

note = "Funding Information: This work was funded by the Advanced Research Projects Agency in a project monitored by the Office of Naval Research Grant No. N00014-93-1-1080 and used the facilities at the National Nanofabrication Facility supported by NSF Grant No. ECS-8619049 and facilities at the Cornell Materials Science Center under Award No. DMR-9121654. We would like to acknowledge assistance from P. Chapman and P. Simpson for help in substrate preparation and etching.",

year = "1995",

month = feb,

doi = "10.1016/0167-9317(94)00052-V",

language = "English (US)",

volume = "27",

pages = "43--46",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "1-4",

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TY - JOUR

T1 - Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes

AU - Lercel, M. J.

AU - Redinbo, G. F.

AU - Rooks, M.

AU - Tiberio, R. C.

AU - Craighead, H. G.

AU - Sheen, C. W.

AU - Allara, D. L.

N1 - Funding Information: This work was funded by the Advanced Research Projects Agency in a project monitored by the Office of Naval Research Grant No. N00014-93-1-1080 and used the facilities at the National Nanofabrication Facility supported by NSF Grant No. ECS-8619049 and facilities at the Cornell Materials Science Center under Award No. DMR-9121654. We would like to acknowledge assistance from P. Chapman and P. Simpson for help in substrate preparation and etching.

PY - 1995/2

Y1 - 1995/2

N2 - Self-assembled monolayers have been demonstrated to perform as high-resolution electron beam resists with minimum resolutions of <20nm for 50keV electron beams and <15nm for 10eV electrons from a scanning tunneling microscope. The resulting patterns have been transferred into many substrates by both wet and dry etching.

AB - Self-assembled monolayers have been demonstrated to perform as high-resolution electron beam resists with minimum resolutions of <20nm for 50keV electron beams and <15nm for 10eV electrons from a scanning tunneling microscope. The resulting patterns have been transferred into many substrates by both wet and dry etching.

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DO - 10.1016/0167-9317(94)00052-V

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JO - Microelectronic Engineering

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Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes

Abstract

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