Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes

M. J. Lercel, G. F. Redinbo, M. Rooks, R. C. Tiberio, H. G. Craighead, C. W. Sheen, D. L. Allara

Research output: Contribution to journalArticle

27 Scopus citations

Abstract

Self-assembled monolayers have been demonstrated to perform as high-resolution electron beam resists with minimum resolutions of <20nm for 50keV electron beams and <15nm for 10eV electrons from a scanning tunneling microscope. The resulting patterns have been transferred into many substrates by both wet and dry etching.

Original languageEnglish (US)
Pages (from-to)43-46
Number of pages4
JournalMicroelectronic Engineering
Volume27
Issue number1-4
DOIs
StatePublished - Feb 1995

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes'. Together they form a unique fingerprint.

Cite this