Electron-beam-induced damage in self-assembled monolayers

Kannan Seshadri, Karl Froyd, Atul N. Parikh, David L. Allara, Michael J. Lercel, Harold G. Craighead

Research output: Contribution to journalArticlepeer-review

118 Scopus citations


Highly organized monolayers formed from the self-assembly of octadecyl derivatives on oxide-covered Si and Ti substrates have been exposed to electron beam impact under typical conditions used in lithographic patterning. A combination of X-ray photoelectron spectroscopy, ellipsometry, infrared spectroscopy, and liquid drop contact angle measurements show that the major effect of irradiation is the loss of H, via cleavage of C-H bonds, to form a carbonaceous residue with a surface containing oxygenated functional groups.

Original languageEnglish (US)
Pages (from-to)15900-15909
Number of pages10
JournalJournal of Physical Chemistry
Issue number39
StatePublished - 1996

ASJC Scopus subject areas

  • Engineering(all)
  • Physical and Theoretical Chemistry


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