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Determination of etching parameters for pulsed XeF2 etching of silicon using chamber pressure data

Dipta Sarkar, M. G. Baboly, M. M. Elahi, K. Abbas, J. Butner, D. Pinon, T. L. Ward, Tyler Hieber, Austin Schuberth, Z. C. Leseman

Research output: Contribution to journal › Article › peer-review

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