Skip to main navigation Skip to search Skip to main content

Contact lithography at 157 nm with an F2 excimer laser

H. G. Craighead, J. C.white, R. E. Howard, L. D. Jackel

Research output: Contribution to journalConference articlepeer-review

Original languageEnglish (US)
Article numberFF4
JournalOptics InfoBase Conference Papers
StatePublished - 1983
EventConference on Lasers and Electro-Optics, CLEO 1983 - Baltimore, United States
Duration: May 17 1983May 20 1983

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

Cite this