Binary optics for optical interconnects

S. M. Shank; H. G. Craighead

doi:10.1117/12.177332

Binary optics for optical interconnects

S. M. Shank, H. G. Craighead

Houston Methodist

Research output: Contribution to journal › Conference article › peer-review

Abstract

4- and 8-level diffractive optical elements (DOEs) are fabricated in silicon using electron beam lithography and reactive ion etching (RIE). An f/1.9, 1mm diameter, 4-phase-level, reflective, off-axis, imaging DOE is fabricated for use in a free-space optical interconnect. The absolute first order efficiency of the DOE is 73%. 8-level linear gratings are fabricated to determine processing tolerances for DOEs with first order diffraction efficiencies greater than 90%.

Original language	English (US)
Pages (from-to)	189-197
Number of pages	9
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	2216
DOIs	https://doi.org/10.1117/12.177332
State	Published - Jun 3 1994
Event	Photonics at the Air Force Photonics Center 1994 - Orlando, United States Duration: Apr 4 1994 → Apr 8 1994

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.177332

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@article{35ff7361bcda4d938bdf3b5858f85cad,

title = "Binary optics for optical interconnects",

abstract = "4- and 8-level diffractive optical elements (DOEs) are fabricated in silicon using electron beam lithography and reactive ion etching (RIE). An f/1.9, 1mm diameter, 4-phase-level, reflective, off-axis, imaging DOE is fabricated for use in a free-space optical interconnect. The absolute first order efficiency of the DOE is 73\%. 8-level linear gratings are fabricated to determine processing tolerances for DOEs with first order diffraction efficiencies greater than 90\%.",

author = "Shank, \{S. M.\} and Craighead, \{H. G.\}",

note = "Funding Information: The authors would like to acknowledge David Mikolas and Rick Bojko. This work Was supported by the National Nanofabrication Facility and Rome Laboratories, contract F3O6O288-D-OO28. Publisher Copyright: {\textcopyright} 1994 SPIE. All rights reserved.; Photonics at the Air Force Photonics Center 1994 ; Conference date: 04-04-1994 Through 08-04-1994",

year = "1994",

month = jun,

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doi = "10.1117/12.177332",

language = "English (US)",

volume = "2216",

pages = "189--197",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

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TY - JOUR

T1 - Binary optics for optical interconnects

AU - Shank, S. M.

AU - Craighead, H. G.

N1 - Funding Information: The authors would like to acknowledge David Mikolas and Rick Bojko. This work Was supported by the National Nanofabrication Facility and Rome Laboratories, contract F3O6O288-D-OO28. Publisher Copyright: © 1994 SPIE. All rights reserved.

PY - 1994/6/3

Y1 - 1994/6/3

N2 - 4- and 8-level diffractive optical elements (DOEs) are fabricated in silicon using electron beam lithography and reactive ion etching (RIE). An f/1.9, 1mm diameter, 4-phase-level, reflective, off-axis, imaging DOE is fabricated for use in a free-space optical interconnect. The absolute first order efficiency of the DOE is 73%. 8-level linear gratings are fabricated to determine processing tolerances for DOEs with first order diffraction efficiencies greater than 90%.

AB - 4- and 8-level diffractive optical elements (DOEs) are fabricated in silicon using electron beam lithography and reactive ion etching (RIE). An f/1.9, 1mm diameter, 4-phase-level, reflective, off-axis, imaging DOE is fabricated for use in a free-space optical interconnect. The absolute first order efficiency of the DOE is 73%. 8-level linear gratings are fabricated to determine processing tolerances for DOEs with first order diffraction efficiencies greater than 90%.

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U2 - 10.1117/12.177332

DO - 10.1117/12.177332

M3 - Conference article

AN - SCOPUS:85076763961

SN - 0277-786X

VL - 2216

SP - 189

EP - 197

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Photonics at the Air Force Photonics Center 1994

Y2 - 4 April 1994 through 8 April 1994

ER -

Binary optics for optical interconnects

Abstract

ASJC Scopus subject areas

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