Binary optics for optical interconnects

S. M. Shank, Harold G. Craighead

Research output: Contribution to journalConference article

Abstract

4- and 8-level diffractive optical elements (DOEs) are fabricated in silicon using electron beam lithography and reactive ion etching (RIE). An f/1.9, 1mm diameter, 4-phase-level, reflective, off-axis, imaging DOE is fabricated for use in a free-space optical interconnect. The absolute first order efficiency of the DOE is 73%. 8-level linear gratings are fabricated to determine processing tolerances for DOEs with first order diffraction efficiencies greater than 90%.

Original languageEnglish (US)
Pages (from-to)189-197
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume2216
DOIs
StatePublished - Jun 3 1994
EventPhotonics at the Air Force Photonics Center 1994 - Orlando, United States
Duration: Apr 4 1994Apr 8 1994

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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