Beam energy effects in electron beam lithography: The range and intensity of backscattered exposure

L. D. Jackel, R. E. Howard, P. M. Mankiewich, H. G. Craighead, R. W. Epworth

Research output: Contribution to journal › Article › peer-review

36 Scopus citations

Fingerprint

Dive into the research topics of 'Beam energy effects in electron beam lithography: The range and intensity of backscattered exposure'. Together they form a unique fingerprint.

Physics & Astronomy