APPROX. 10nm ELECTRON-BEAM LITHOGRAPHY WITH AN (S)TEM.

Research output: Contribution to journalConference article

1 Scopus citations

Abstract

A variety of devices and structures with dimensions greater than equivalent to 10nm have been fabricated by electron-beam lithography. To accomplish this goal a modified (scanning) transmission electron microscope left bracket (S)TEM right bracket has been used as an electron-beam writing instrument, probing the size limits of conventional electron-beam lithography and studying novel electron-beam micro-fabrication techniques. An outline of techniques for fabricating ultrasmall structures with this type of instrument is given and specific examples are discussed. Several features of this type of electron microscope facilitated the fabrication of very small structures.

Original languageEnglish (US)
Pages (from-to)73-75
Number of pages3
JournalProceedings, Annual Conference - Microbeam Analysis Society
StatePublished - Dec 1 1984

ASJC Scopus subject areas

  • Engineering(all)

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