Actuation and internal friction of torsional nanomechanical silicon resonators

A. Olkhovets; S. Evoy; D. W. Carr; J. M. Parpia; H. G. Craighead

doi:10.1116/1.1313571

Actuation and internal friction of torsional nanomechanical silicon resonators

A. Olkhovets, S. Evoy, D. W. Carr, J. M. Parpia, H. G. Craighead

Houston Methodist

Research output: Contribution to journal › Conference article › peer-review

29 Scopus citations

Abstract

The actuation and internal friction of torsional resonators were theoretically and experimentally analyzed. It was shown that torsional excitation could be provided from the asymmetry resulting from fabrication imperfections as small as 10-20 nm. A thin Al film was found to have a great degrading effect on Q. A broad peak of temperature dependent internal friction observed in the 160-190 K range was attributed to Debye relaxation.

Original language	English (US)
Pages (from-to)	3549-3551
Number of pages	3
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	18
Issue number	6
DOIs	https://doi.org/10.1116/1.1313571
State	Published - Nov 2000
Event	44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA Duration: May 30 2000 → Jun 2 2000

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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title = "Actuation and internal friction of torsional nanomechanical silicon resonators",

abstract = "The actuation and internal friction of torsional resonators were theoretically and experimentally analyzed. It was shown that torsional excitation could be provided from the asymmetry resulting from fabrication imperfections as small as 10-20 nm. A thin Al film was found to have a great degrading effect on Q. A broad peak of temperature dependent internal friction observed in the 160-190 K range was attributed to Debye relaxation.",

author = "A. Olkhovets and S. Evoy and Carr, {D. W.} and Parpia, {J. M.} and Craighead, {H. G.}",

note = "Copyright: Copyright 2007 Elsevier B.V., All rights reserved.; 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication ; Conference date: 30-05-2000 Through 02-06-2000",

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T1 - Actuation and internal friction of torsional nanomechanical silicon resonators

AU - Olkhovets, A.

AU - Evoy, S.

AU - Carr, D. W.

AU - Parpia, J. M.

AU - Craighead, H. G.

PY - 2000/11

Y1 - 2000/11

N2 - The actuation and internal friction of torsional resonators were theoretically and experimentally analyzed. It was shown that torsional excitation could be provided from the asymmetry resulting from fabrication imperfections as small as 10-20 nm. A thin Al film was found to have a great degrading effect on Q. A broad peak of temperature dependent internal friction observed in the 160-190 K range was attributed to Debye relaxation.

AB - The actuation and internal friction of torsional resonators were theoretically and experimentally analyzed. It was shown that torsional excitation could be provided from the asymmetry resulting from fabrication imperfections as small as 10-20 nm. A thin Al film was found to have a great degrading effect on Q. A broad peak of temperature dependent internal friction observed in the 160-190 K range was attributed to Debye relaxation.

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DO - 10.1116/1.1313571

M3 - Conference article

AN - SCOPUS:0034314868

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JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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T2 - 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Y2 - 30 May 2000 through 2 June 2000

ER -

Actuation and internal friction of torsional nanomechanical silicon resonators

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