10-nm resolution electron-beam lithography

Harold G. Craighead

Research output: Contribution to journalArticlepeer-review

46 Scopus citations


An analytical electron microscope has been used to fabricate a variety of ultrasmall structures and to test the size limits and some basic concepts of high-resolution electron-beam lithography. Arbitrarily shaped patterns on both thin film and bulk substrates have been written with dimensions of approximately 10 nm. A review of devices, structures, materials, and techniques is presented.

Original languageEnglish (US)
Pages (from-to)4430-4435
Number of pages6
JournalJournal of Applied Physics
Issue number12
StatePublished - Dec 1 1984

ASJC Scopus subject areas

  • Physics and Astronomy(all)


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